Fahrenheit Thermoscope LLC
2215-B Renaissance Drive
Suite 5
Las Vegas, NV 89119
Patents
Correspondent
Process For Etching A Polycrystalline Si (1-x) Ge (x) Layer Or A Stack Of Polycrystalline Si (1-x) Ge (x) Layer And Of A Polycrystalline Si Layer, And Its Application To Microelectronics
X0Patent Application No.09103121, Filed June 23, 1998
B1Utility Patent No. 6271144, Issued August 7, 2001